NNT 2023, the 22nd International Conference on Nanoimprint and Nanoprint Technologies, the world’s leading symposium on nanoimprint and nanoprint, will take place October 9-11, 2023, at the Boston Seaport Hotel.

NNT 2023 Plenary & Keynote Speakers
Plenary: Professor Federico Capasso, Harvard University, Recent Advances in Flat Optics of Metasurfaces
Keynote: George Palikaras, Meta Materials Inc., Unlocking the Invisible: The Revolutionary Potential of Metamaterials
NNT 2023 Keynote Speakers
Keynote: Stella Pang, City University of Hong Kong
NNT 2023 Invited Speakers
Featured presentations from:
Brad Williams, Moxtek, Inc.

Akira Saito, Osaka University

Yosuke Okamura, Tokai University
Junsuk Rho, POSTECH, Korea

David Grosso, Aix-Marseille Université
NNT 2023 Invited Speakers
Featured presentations from:
Shree Deshpande, Tok America

Yosuke Okamura, AIST, Japan

Ismo Vartiainen, Dispelix Oy
Youngtae Cho, Changwon National University

Eleonora Storace, IMEC

Reinhard Voelkel, SÜSS MicroOptics
NNT 2023 Invited Speakers
Featured presentations from:
Amir Arbabi, Univ. of Massachusetts

Kneidinger Andrea, EV Group

Theodor Neisen, NIL Technology ApS
Arne Schleunitz, Micro Resist Technology GmbH

Dieter Nees, Joanneum Research

Stephan Prinz, DELO Industrie Klebstoffe GmbH
NNT 2023 Invited Speakers
Featured presentations from:
Michael Mühlberger, PROFACTOR GmbH

Scott Carden, Magic Leap

Brid Connolly, Toppan

Jin Choi, Canon
Nikos Kehagias, Demokritos Institute

Kevin Lou, Sunny OmniLight

Stephen Chou, Princeton

Peter Guschl, Pixelligent

About NNT 2023

NNT 2023, the 22nd International Conference on Nanoimprint and Nanoprint Technologies, the world’s leading symposium on nanoimprint and nanoprint, will take place October 9-11, 2023, at The Boston Seaport Hotel, Boston Massachusetts, USA.

NNT2023 is focused on next generation technologies, products and manufacturing processes and is structured with both the research and commercial communities in mind. The meeting will feature invited and contributed lectures on the latest developments in imprint technology. A series of plenary lectures from leading researchers within and external to the imprint community will focus on new and emerging areas in which imprint technology can expand and have significant commercial and scientific impact, including metamaterials, augmented and virtual reality, energy generation and storage, intelligent nanoscale devices and the life sciences. The conference will also offer a unique nanoimprint ecosystem session and roundtable discussion in which providers of tools, masters, materials and open access research and process development facilities will converge in a single session to provide a comprehensive look at potential commercialization paths for bringing product concepts from the laboratory to manufacturing. NNT 2023 will feature an extensive poster session describing recent science and technology advances as well as vendor exhibits from companies and institutes spanning the NIL ecosystem. An online portal for pre scheduling 1:1 meetings among conference participants, presenters in the ecosystem sessions and/or vendors will be provided to maximize opportunities for relationship building. Additional opportunities for networking and informal socializing will occur on a dinner cruise on the Boston Harbor.

An optional post-conference tour to the $US 25 million Advanced Print and Roll-to-Roll Manufacturing Demonstration Facility at the University of Massachusetts Amherst will be arranged for those wishing to see facilities for implementation of the latest development in continuous imprinting technology and complementary processes for device integration and manufacturing.

NNT2023 Committee

Name: 2023 International Conference on Nanoimprint and Nanoprint Technologies - NNT2023
Start: 2023-10-09
End: 2023-10-11
Location: The Boston Seaport Hotel

International Steering Committee

Stephen Y. Chou, Princeton University
Yoshihiko Hirai, Osaka Metropolitan University
Eung-Sug Lee, Korea Institute of Machinery & Materials
Lars Montelius, International Iberian Nanotechnology Laboratory
Douglas Resnick, Canon Nanotechnologies Inc.
Helmut Schift, Paul Scherrer Institut

International Program Committee

Jin Choi, Canon
L. Jay Guo, University of Michigan
Jussi Hiltunen, VTT
Nikos Kehagias, Demokritos Institute
Heon Lee, Korea University
Jeff Morse, University of Massachusetts
Stella Pang, City University of Hong Kong
M S M Saifullah, ASTAR Singapore
Helmut Schift, Paul Sherrer Institut
Barbara Stadlober, Joanneum (Austria)
Jim Watkins, University of Massachusetts
Qiangfei Xia, University of Massachusetts

Industry Advisory Board

Craig Bandes, Pixelligent
Shane Bowen, SomaLogic
David Crosby, Waveoptics
Andrea Kneidinger, EVG
Patrik Lundström, Obducat
Michael Mühlberger, Profactor
Theodor Neilsen, NILT
George Palikaras, Metamaterials

Meeting Chair

Jim Watkins, University of Massachusetts, watkins@polysci.umass.edu

NIL Ecosystem

NIL Ecosystem Session

NNT2023 will offer a unique nanoimprint ecosystem session with full length technical talks and a closing roundtable discussion in which providers of tools, masters, materials and open access research and process development facilities will converge in a single session to deliver a comprehensive look at potential commercialization paths for bringing product concepts from the laboratory to manufacturing. Authors interested in presenting a full length talk should submit a regular abstract through the online abstract submission portal and indicate that they are interested in presenting in the NIL Ecosystem Session. While these talks by necessity are expected to contain some business content and market outlook, the content should primarily be science and/or technology driven (e.g. they should not be marketing talks). Content can include fundamental studies, case studies, and/or examples of current commercial applications or applications on a pathway towards commercialization, so long as there is a technical driver. The round table following the technical talks will include very brief overviews by panelists from industry and from research centers, including our exhibitors and presenters of the technical talks in this session, to set the stage for the interactive discussion.

Agenda

updated October 5, 2023
Download PDF

Monday, October 9

10:30 – 11:00

Registration

11:00 – 12:00

Lunch

12:00 – 2:20

Session 1 - Optics 1

12:00	Welcome and Introduction
12:10	Recent Advances in Flat Optics of Metasurfaces Federico Capasso (Plenary Speaker)
1:00	XR waveguides – Complete loop from the simulations to optically verified performance of diffractive waveguides Ismo Vartiainen (invited)
1:20	Direct Full Wafer Nanoimprinting for High Efficency All-Inorganic Metalenses and Waveguides Vince Einck (invited)
1:40	Wafer level nano-optics solution for AR glasses Kevin Lou (invited)
2:00	Fabrication and practical applications of optical metasurfaces Amir Arbabi (invited)

2:20

Break

3:10 – 6:05

Session 2 - Optics 2

3:10	Direct NIL patterning of sol-gel based metal oxides, with controlled refractive index from 1.2 to 2.7, on 8 inches wafers; applications in optics, photonic, and gas sensing. Marco. Abbarchi, Mehrnaz Modaresialam, Martin. O'Byrne, Badre Kerzabi, Zeinab. Chehadi, Ye. Zhou, and David Grosso (invited)
3:30	Diffraction-based optical diffuser inspired by Morpho butterfly's nanostructure Akira Saito, Kazuma Yamashita, Takuma Hattori, and Yuji Kuwahara (invited)
3:50	Optimizing the Residual Layer Uniformity Using Inkjet Printing Technology for AR Applications Fabian Kloiber, Simon Drieschner, Bas Le Grand, Joost Hermans, Vijay R. Kolli, Marc Hennemeyer
4:10	Tailored polymers for wafer-level optics manufacturing Stephan Prinz (invited)
4:25	Nanoimprint Lithography Using Novel Optical Materials For AR\|MR Devices Shree Deshpande (invited)
4:45	Matching material and process - The route to success for high-volume manufacturing of high-quality imprinted lenses Markus Brehm, Paige Deshler, Mikhail Begel, Andrea Kneidinger and Stephan Prinz
5:05	Adaptable large area metasurfaces for customised applications N. Dimogerontaki, N. Matthaiakakis, N. Papanikolaou, N. Kehagias (invited)
5:25	Visible Metalens Volume Production Line Bradley R Williams, Daniel Bacon-Brown, Matthew C. George, Rumyana V Petrova, Adam W. Korb, Jamie C. Stocks (invited)
5:45	30 Years Path to Subwavelength Optical Elements Development, Application, and Fabrication Stephen Y. Chou (invited)

6:15

Posters and Networking Reception in the Exhibit Hall

Tuesday, October 10

Continental Breakfast

9:00 – 10:00

Session 3 - Optics 3

9:00	Filler-Free NIL Compatible Ultra-High Refractive Index Resins for Photonic Applications Carlos Pina-Hernandez, Kaito Yamada, Keiko Munechika
9:15	Fabrication of moth-eye-structured roll mold and application of moth-eye-structure Jun Taniguchi
9:30	Study on induced strain during releasing process for slanted grating structure in nanoimprint process Yuusei Kunitou, Masaaki Yasuda, Yoshihiko Hirai
9:45	Development of sub-wavelength structure optics by injection molding process Kazuma Kurihara, Genki Kuwano and Hokari Ryohei (invited)

10:05

Morning Break in Exhibit Hall

10:30 – 12:40

NIL Ecosystem Session 1

10:30	Unlocking the Invisible: The Revolutionary Potential of Metamaterials George Palikaras (Keynote Speaker)
11:00	Unlocking High Performance Waveguides at Scale with Jet and Flash Imprint Lithography Scott Carden (invited)
11:20	Advanced Displays: The Material Difference Peter C Guschl, Serpil G Williams, Grace E McClintock (invited)
11:40	Update on fast prototyping and manufacturing of metalenses Theodor Nielsen (invited)
12:00	NIL Mastering using advanced manufacturing imaging technology Brid Connolly, Dr. Martin Sczyrba (invited)
12:20	NIL processing in a 300mm CMOS Fab line Eleonora Storace, Mohamed Asbahi, Pau Guell I Grau, Steve Smout, Myriam Willegems, Bogumila Kutrzeba Kotowska, Silvia Lenci, Matt Traub (invited)

12:40 – 1:30

Lunch

1:30 – 3:30

NIL Ecosystem Session 2

1:30	Advantages of Inkjet Coating Combined with Nanoimprint Lithography in Nanostructured AR Waveguide Fabrication Johanna Rimbock, Patrick Schuster, Christine Thanner, Lisa Vsetecka, Enrique Lopez, Andrea Kneidinger (invited)
1:50	Large-area Nanoimprint Lithography as a solution for mass manufacturing of AR optics Nico Jansen (invited)
2:10	300mm soft-NIL of functional materials for photonic- and bio- applications Marc A. Verschuuren
2:30	All the Places Nanoimprinting Can Go: Patterning Carbons, Ceramics and Metals for Advanced Devices Jim Watkins (invited)
2:50	The Microlens Revolution in Automotive Lighting and the Requirements for Future Imprint Production Tools Reinhard Voelkel (invited)
3:10	Establishing a Nanoimprint Lithography Ecosystem Jin Choi (invited)
3:30	Process solutions that enabled the industrialization of NIL technology Patrik Lundström

3:50

Afternoon Break in Exhibit Hall

4:20

Roundtable:
Push/Pull for Broadly Commercializing NIL

6:00

Dinner Cruise on Boston Harbor

Wednesday, October 11

Continental Breakfast

9:00 – 10:30

Session 4 - Process 1

9:00	Bio-Based Photo-Initiators for UV-Nano-Imprint Resins Dieter Nees (invited)
9:20	Study of the transfer of a biosourced resin by thermal nanoimprinting Paule Durin, Celine Chevalier, Aziz Benamrouche, Radoslaw Mazurczyk, Yann Chevolot, Didier Leonard, Jean-Louis Leclercq (invited)
9:35	Next generation NIL materials - an evolution from lab to fab M. Lohse, M. Messerschmidt, N. Heidensohn, S. Gruetzner, A. Schleunitz, and G. Gruetzner (invited)
10:05	Low-cost and scalable manufacturing of optical metasurfaces in the visible using engineered optical materials (PER, low-loss a-Si:H, and hybrid ALD structural resin) Junsuk Rho (invited)

10:30

Morning Break in the Exhibit Hall

11:00 – 12:20

Session 5 - Process 2

11:00	Room temperature imprint and extrusion based printing of water-based microparticle inks towards glass microfluidic devices Helmut Schift
11:15	Digital patterning of slippery surfaces for liquid manipulation Sang Hoon Lee, Woo Young Kim, Seok Kim and Young Tae Cho (invited)
11:35	Continuous nanopatterning of very large areas using nanocoining and roll-to-roll nanoforming Lauren Micklow, B Diane Martin, Nichole Cates, Dennis Slafer, Stephen Furst
11:50	Scalable High Throughput Additive Manufacturing of Nano and Microelectronics Ahmed Busnaina
12:05	Conformal Electrochemical Nanoimprinting of Silicon: Towards Bio-Inspired Infrared Meta-Optics Bruno Azeredo

12:20 – 1:00

Lunch

1:00 – 2:00

Posters and Networking Reception in the Exhibit Hall

2:00 – 3:50

Session 6 - Bio

2:00	Nanoimprint Technology for Biosensing and Metadevices Stella W. Pang (Keynote Speaker)
2:30	Nanoimprinting of Micro- and Nanostructures for Life Science Applications Michael J. Haslinger, Sonja Kopp, Michael M. Muehlberger (invited)
2:50	Porous Nanosheet Wrapping Fabricated by Nanoimprinting Technique for High Quality Bioimaging Yosuke Okamura (invited)
3:10	Printing Nanoporous Metallic Membranes For Improved Stem Cell Delivery Thomas J. Webster

3:40

Afternoon Break in the Exhibit Hall

4:35

Farewell

6:00

Committee Dinner

Thursday, October 12

7:45 - 3:30

Optional Tour of Advanced Print and Roll-to-Roll Manufacturing Demonstration Facility at UMass Amherst

Transportation and Lunch Provided (space is limited to first 50 participants)

7:45	Bus Departs for UMass Amherst
10:00	Bus Arrives UMass Amherst
10:30	Convene Life Science Laboratories Conference Center S330 Coffee Break
10:45	Facilities and Capabilities Overview and Discussion
11:45	Catered Lunch - Networking Sponsored by:
12:30	Facility Tours
1:15	Wrap-up
2:00	Bus Departs for Boston Seaport
4:00	Bus Arrives at Seaport Hotel

Exhibit Hall

Poster Session

UV-Nanoimprinting to Modify 3D-Printed Ceramic Surfaces
Sonja Kopp, Abhijeet Lale, Viktorija Jonaityte, Michael J. Haslinger, Martin Schwentenwein, Francesco Moscato, Michael M. Muehlberger
Fabrication of Surface Microstructures and Investigation of their Influence on the Interaction with Blood for Use in a Left Ventricular Assist Device
Marta Bonora, Stjepan Perak, Sonja Kopp, Sarah Linnemeier, Richard Benauer, Markus Lunzer, Francesco Moscato, Marcus Granegger, Michael M. Muehlberger
Large-area fabrication of a Morpho butterfly-inspired optical diffuser using nanoimprint lithography
Kazuma Yamashita, Takuma Hattori, Yuji Kuwahara, and Akira Saito
Approach for process design solving invers problem by deep learning for nanoimprint process
Yuusei Kunitou, Masaaki Yasuda, Yoshihiko Hirai
Local Modification of Polymer Properties in Nanoimprint
Roberto R. Panepucci
Fabrication of high formable shape memory alloy nano/micro size cilium using thermal nanoimprint
Junpei Sakurai, Kanta Sato, Chiemi Oka, and Seiichi Hata
Fabrication of diffraction textured substrate for DSSCs
Ryutaro Kimura, Chiemi Oka, Seiichi Hata, Junpei Sakurai
Towards Nanoimprinted Waveguides made of Inkjet-able High Refractive Index Materials
Michael J. Haslinger, Gerald Stubauer, Peter Bauer, Sebastian Kauscheder, Viktorija Jonaityte, Katerina Masopustova, Sonja Kopp, Michael Muehlberger
Functional vertical sidewalls and draft angles for easy demolding in the same mold in thick epoxy resist
Helmut Schift
Direct Imprinting of Aqueous TiO2 Nanocrystal Dispersions for Sustainable Metasurface Fabrication
Chavez Lawrence
How far does a droplet of UV-curable liquid spread between the mold and silicon surfaces in nanoimprinting?
Masaru Nakagawa, Akiko Onuma, Hiromasa Niinomi, Shintaro Itoh, Kenji Fukuzawa, and Toshiya Asano
Imprinting of residual-layer-thickness optimized large micro-structures enabled by the new organic UV-patternable resist «mr-NIL210SF»
Martin Messerschmidt
Non-destructive in-line nano-metrology techniques for roll to roll nanoimprint lithography manufacturing processes
I. Raptis, V. Constantoudis, K. Tourlouki, T. Tachtsidis, C. Katsogridakis, E. Almpanis, N. Papanikolaou, A. Stellas, D. Goustouridis, P. Argitis, N. Kehagias
High-Throughput Fabrication of TiO2-based Metalenses with Absolute Efficiencies Over 80% and Relative Efficiencies Over 90%
Dae Eon Jung, Alex Dawicki, Vincent J. Einck, Lucas D. Verrastro, Amir Arbabi, and James J. Watkins
Nanoporous Carbon Pillars Fabricated via Nanoimprint Lithography as Structural Metamaterials for Energy Storage Devices
Ayush Bharadwaj, Zhongyuan Li, Varun Pande, Seok-Woo Lee, James J. Watkins
Mechanically Tunable Plasmonic Device Fabricated with Dielectric Slide Ring Elastomer Bragg Mirror and Integrated Gold Metasurface
Sravya M. Nuguri, Lucas D. Verrastro, Daniel Shreiber, Ben Cerjan, Vincent Einck, Naomi J. Halas, Mark H. Griep, and James J. Watkins*

Abstracts

Deadline for abstract submissions ended: June 30, 2023

Form for Abstract Submission

NNT 2023 Call for Papers

NNT2023 is focused on Next Generation Technologies, Products and Manufacturing Processes and is structured with both the research and commercial communities in mind. The meeting will feature invited and contributed lectures on the latest developments in imprint technology. There will be a focus on new and emerging areas in which imprint technology can expand and have significant commercial and scientific impact, including metamaterials, augmented and virtual reality, energy generation and storage, intelligent nanoscale devices and the life sciences. The conference will also offer a unique nanoimprint ecosystem session and roundtable discussion in which providers of tools, masters, materials and open access research and process development facilities will converge in a single session.

Abstracts may be submitted through the web site portal. The maximum length is two-pages. The first page should contain text. The second page should contain figures, images, data tables etc. as needed, and references. Please use the template provided. The deadline for abstract submissions has been extended to June 30, 2023.

Topics for submission include emerging technologies and applications including advanced optics, energy storage, electronics and life sciences, new materials sets for imprinting of functional films and devices, hybrid integration of NIL with other technologies for device applications, next generation stamps and mastering technology, recent advances in tool design and capabilities, and emerging commercial applications. We further welcome contributions from technical areas adjacent and complementary to imprint and nanoprint technologies that share common target applications, including nanopatterning, soft lithography, direct write technologies, 3-D printing and additive manufacturing.

If you are interested in presenting in the NIL Ecosystem Session, please check the box on the submission form. Please note that submissions to the Ecosystem Session must contain strong technical content and cannot be primarily an overview of business directions.

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Exhibition

Exhibitor Registration

Exhibitor Shipping Information
Seaport Hotel
One Seaport Lane
Boston, MA 02210
October 9-11, 2023
NNT Exhibitor, attention Peter Moriarty

NNT2023 is focused on connecting leading edge advances in the imprint and nanoprint communities to the broader NIL ecosystem including tech transfer, contract R&D, materials, tools and technology providers, and ultimately commercialization opportunities. The meeting will provide high visibility and ample opportunities for our exhibitors to interact with the industry, academic and national lab communities. The Monday evening reception following the NIL Ecosystem Session as well as breaks each day will take in concert with the exhibition. Our exhibitors will be provided the option of participating in the NIL Ecosystem Roundtable discussion following the sessions as well as the opportunity to submit technical talks for consideration for the Ecosystem and other Technical Session of the meeting. We will provide information about each exhibitor on the NNT website and include web links that our participants can follow to access additional information. NNT2023 will provide a secure online portal for pre scheduling 1:1 meetings among registered conference participants and our exhibitors to maximize opportunities for relationship building. Information and registration for our exhibitors can be accessed at the exhibition registration link.

Venue

Boston Seaport Hotel

One Seaport Lane, Boston, Massachusetts 02210
617-385-4000
Email: info@seaportboston.com
https://www.seaportboston.com/

Accommodations

The organizing committee of NNT 2023 has secured hotel rooms at the special group rate of $329/night at Boston Seaport Hotel using group code 3776688.

Located in the popular Seaport District adjacent to downtown and all of central Boston, Seaport is perfectly located for business or pleasure. We're just ten minutes from Logan Airport by tunnel or water, we have our own MBTA "T" stop on campus and we're connected to Boston's three major highways. More travel information...

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	Oral Presentation
	Poster Session
	NIL Ecosystem Session
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About NNT 2023

NNT2023 Committee

International Steering Committee

International Program Committee

Industry Advisory Board

Meeting Chair

NIL Ecosystem

NIL Ecosystem Session

Agenda

Monday, October 9

Session 1 - Optics 1

Session 2 - Optics 2

Tuesday, October 10

Session 3 - Optics 3

NIL Ecosystem Session 1

NIL Ecosystem Session 2

Roundtable: Push/Pull for Broadly Commercializing NIL

Dinner Cruise on Boston Harbor

Wednesday, October 11

Session 4 - Process 1

Session 5 - Process 2

Session 6 - Bio

Thursday, October 12

Optional Tour of Advanced Print and Roll-to-Roll Manufacturing Demonstration Facility at UMass Amherst

Exhibit Hall

Poster Session

Abstracts

Form for Abstract Submission

NNT 2023 Call for Papers

Exhibition

Sponsors

Venue

Boston Seaport Hotel

Accommodations

Get In Touch.

Contact Information

NNT2023 Group

NNT History

Roundtable:
Push/Pull for Broadly Commercializing NIL